Since the first edition was published in 2008, Atomic Layer Deposition has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials.
Language
English
Pages
272
Format
Kindle Edition
Publisher
Wiley-Scrivener
Release
May 17, 2013
Atomic Layer Deposition: Principles, Characteristics, and Nanotechnology Applications
Since the first edition was published in 2008, Atomic Layer Deposition has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials.